Dan Beane, Sr Engineer at Carpe Diem Technologies, recently gave a talk about roll-to-roll (R2R) atomic layer deposition (ALD) systems to NNT 2019 conference attendees who visited UMass Amherst.  NNT 2019 is the International Conference on Nanoimprint and Nanoprint Technologies held this year at the Boston Seaport.

The audience was comprised of 50 NIL experts from around the world.