Nano Imprint Lithography

The Carpe Diem Nano Imprint Lithography system provides the capability to unwind and pretreat a flexible substrate or web, coat with photoresist, and then imprint nanometer or micron scale features from a PDMS, nickel or other master or stamper to a web and then rewind. This system can be provided with NIL modules for UV exposure through a transparent substrate, UV exposure through the mask for opaque substrates or for thermal emboss of thermoplastic substrates or coatings.

Meta materials – Hydrophobic, Super Hydrophobic, Antibacterial, Magnetic, Structural color…

  • Waveguide, diffractive and micro refractive optics
  • Hologram production
  • Multilayer printed electronics
  • Additive, no develop masking
  • Microfluidic devices
  • Pharmaceutical micro capsules
  • Direct “single step” material patterning
  • Water Purification
  • Batteries
  • Thin film organic electronic devices

Benefits of R2R NIL are:

  • Cost Efficient
  • High Resolution
  • Flexible Inexpensive Substrates
  • High Throughput
  • Fast and Accurate method for Structure transfer
  • UV or Thermal curing of resist
  • Versatility (ability to change geometries, structure size, etc.)

The Nanoimprint Lithography systems created by Carpe Diem Technologies include:

Roll-to-Roll Nanoimprint Lithography enables development and production of low cost, large-area nano-materials and devices.


Speed 3in/min up to 800in/min (100mm/min up tp 20000mm/min)
Web Width 6 in to 12 in (150mm to 300mm)
Web Thickness 10μm up to 250μm
External Roll Diameter Maximum 6in @ 6 in Web Width
Web Tensile Stress Typical 0-5lbs nominal tension
Materials PC,PMMA,PET,PS

Other sizes and options available upon request

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