Nano Imprint Lithography
The Carpe Diem Nano Imprint Lithography system provides the capability to unwind and pretreat a flexible substrate or web, coat with photoresist, and then imprint nanometer or micron scale features from a PDMS, nickel or other master or stamper to a web and then rewind. This system can be provided with NIL modules for UV exposure through a transparent substrate, UV exposure through the mask for opaque substrates or for thermal emboss of thermoplastic substrates or coatings.
Meta materials – Hydrophobic, Super Hydrophobic, Antibacterial, Magnetic, Structural color…
- Waveguide, diffractive and micro refractive optics
- Hologram production
- Multilayer printed electronics
- Additive, no develop masking
- Microfluidic devices
- Pharmaceutical micro capsules
- Direct “single step” material patterning
- Water Purification
- Batteries
- Thin film organic electronic devices
Benefits of R2R NIL are:
- Cost Efficient
- High Resolution
- Flexible Inexpensive Substrates
- High Throughput
- Fast and Accurate method for Structure transfer
- UV or Thermal curing of resist
- Versatility (ability to change geometries, structure size, etc.)
The Nanoimprint Lithography systems created by Carpe Diem Technologies include:
Roll-to-Roll Nanoimprint Lithography enables development and production of low cost, large-area nano-materials and devices.
TECHNICAL SPECIFICATIONS OF SYSTEMS
| Speed | 3in/min up to 800in/min (100mm/min up tp 20000mm/min) |
| Web Width | 6 in to 12 in (150mm to 300mm) |
| Web Thickness | 10μm up to 250μm |
| External Roll Diameter | Maximum 6in @ 6 in Web Width |
| Web Tensile Stress | Typical 0-5lbs nominal tension |
| Materials | PC,PMMA,PET,PS |
Other sizes and options available upon request
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